STRUCTURAL, OPTICAL AND ELECTRICAL PROPERTIES OF CHEMICAL BATH DEPOSITED NIO THIN FILMS
Journal Title: International Journal of Engineering Sciences & Research Technology - Year 30, Vol 5, Issue 10
Abstract
NiO thin films have been synthesized by using chemical bath deposition method at various deposition times. The deposited films are further characterized for structural, morphological, optical and electrical properties by XRD, SEM, UV-Visible and two probe techniques respectively. The structural analysis carried out by XRD, shows polycrystalline nature of films with cubic crystal structure. The SEM images shows surface has porous structure with honeycomb like pores. Optical band gap NiO thin film founds to be 3.1 eV. The electrical resistivity of NiO thin films is of the order of 105 Ω-cm.
Authors and Affiliations
U. J. Chavan
Keywords
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- EP ID EP96393
- DOI 10.5281/zenodo.160859
- Views 64
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