Aspects about Reactive Magnetron Sputtering Deposition Technique

Journal Title: RECENT - Year 2010, Vol 11, Issue 29

Abstract

Within the frame of this work the reactive magnetron sputtering technique used for deposition of the thin films was investigated. Magnetron sputtering is a flexible technique which can be used to coat virtually any work piece with a wide range of materials. This technique is one of the most used physical vapour deposition technology in very large areas from industrial applications to jewellery coatings. In the present paper is presented the reactive magnetron sputtering technique and its characteristics.

Authors and Affiliations

Roxana ARVINTE, Mihai APREUTESEI, Elena CLINCIU

Keywords

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  • EP ID EP84911
  • DOI -
  • Views 133
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How To Cite

Roxana ARVINTE, Mihai APREUTESEI, Elena CLINCIU (2010). Aspects about Reactive Magnetron Sputtering Deposition Technique. RECENT, 11(29), 61-66. https://europub.co.uk./articles/-A-84911