Etching-assisted femtosecond laser modification of hard materials
Journal Title: Opto-Electronic Advances - Year 2019, Vol 2, Issue 9
Abstract
With high hardness, high thermal and chemical stability and excellent optical performance, hard materials exhibit great potential applications in various fields, especially in harsh conditions. Femtosecond laser ablation has the capability to fabricate three-dimensional micro/nanostructures in hard materials. However, the low efficiency, low precision and high surface roughness are the main stumbling blocks for femtosecond laser processing of hard materials. So far, etching-assisted femtosecond laser modification has demonstrated to be the efficient strategy to solve the above problems when processing hard materials, including wet etching and dry etching. In this review, femtosecond laser modification that would influence the etching selectivity is introduced. The fundamental and recent applications of the two kinds of etching assisted femtosecond laser modification technologies are summarized. In addition, the challenges and application prospects of these technologies are discussed.
Authors and Affiliations
Xue-Qing Liu, Ben-Feng Bai, Qi-Dai Chen, Hong-Bo Sun*
Keywords
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- EP ID EP683114
- DOI 10.29026/oea.2019.190021
- Views 148
- Downloads 0
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